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首页> 外文期刊>Physica status solidi, B. Basic research >Epitaxial formation of a multilayer Pd-Ta surface alloy on a Ta substrate
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Epitaxial formation of a multilayer Pd-Ta surface alloy on a Ta substrate

机译:在Ta基体上外延形成多层Pd-Ta表面合金

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摘要

A thick palladium layer (similar to5 nm) is deposited onto a curved tantalum surface. The system is submitted to several annealing cycles. Structural changes within 0-5 nm below the surface are observed using Field Ion Microscopy. At 800 K, an atomic intermixing of adsorbate and substrate is observed. Pd atoms are detected within the first five atomic layers of the Ta substrate. At 1100 K, a multilayer alloy is formed at the surface, oriented epitaxially with respect to the Ta{100} planes. [References: 9]
机译:厚的钯层(约5 nm)沉积在弯曲的钽表面上。该系统经历了几个退火周期。使用场离子显微镜观察到表面以下0-5 nm内的结构变化。在800 K下,观察到吸附物和底物的原子混合。在Ta衬底的前五个原子层中检测到Pd原子。在1100K,在表面上形成相对于Ta {100}平面外延取向的多层合金。 [参考:9]

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