Concentration methods for the detection of trace elements in UPW

摘要

The article describes methods, that can be used to concentrate ultra pure water for the detection of metallic trace impurities. A few possibilities for the concentration step are discussed. A new alternative, namely the vaporization on a silicon wafer combined with the vapor phase decomposition (VPD) technique is found to be a suitable candidate. The analysis of metallic impurities with the total reflection X-ray fluoresence (TXRF) and graphite furnace atomic absorption spectroscopy (GF-AAS) is shown to be extendable well into the sub-ppt regime. [References: 4]