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Static dielectric constants of the binary mixtures of N-methylformamide with water, ethyl alcohol, ethylene glycol, dimethylsuiphoxide, acetone and 1,4-dioxane

机译:N-甲基甲酰胺与水,乙醇,乙二醇,二甲基亚砜,丙酮和1,4-二恶烷的二元混合物的静态介电常数

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摘要

The static dielectric constants of binary mixtures of N-methylformamide (NMF), used as a solute with the solvents water (W), ethyl alcohol (EA), ethylene glycol (EG), dimethyl sulphoxide (DMSO), acetone (Ac) and 1,4-dioxane (Dx), have been measured over the entire concentration range at 30°C. The negative values of excess dielectric constant and less-than-unity values of the corrective Kirkwood correlation factor of these binary mixtures are used to analyse the formation of H-bond complexes and molar ratio of the stable adduct. In these systems, the unassociated mixture constituents, DMSO, Ac and Dx, act as structure-breakers for self-associated linear structures of NMF, whereas, both the self-associated mixture constituents (W, EA and EG mixtures with NMF) act as structure-breakers to each other during the complexations. It is found that the large variations in the strength of H-bond complexation and the effective number of parallel aligned dipoles in the mixtures are governed by the dielectric constant of the solvents.
机译:N-甲基甲酰胺(NMF)与溶剂(水),乙醇(EA),乙二醇(EG),二甲亚砜(DMSO),丙酮(Ac)和溶剂一起用作溶质的二元混合物的静态介电常数已在30°C的整个浓度范围内测量了1,4-二恶烷(Dx)。这些二元混合物的过量介电常数的负值和校正柯克伍德相关因子的小于一的值用于分析H键络合物的形成和稳定加合物的摩尔比。在这些系统中,未缔合的混合物成分DMSO,Ac和Dx充当NMF自缔合线性结构的结构破坏者,而两种自缔合的混合物成分(W,EA和EG与NMF的混合物)都充当复杂过程中彼此破坏结构。发现混合物中氢键络合强度的大变化和平行排列偶极子的有效数目受溶剂介电常数控制。

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