Self-assembling behavior and inhibition effect of dodecanethiol self-assembled monolayers on copper surface

摘要

The self-assembling behavior and inhibition effect of dodecanethiol self-assembled monolayers (SAMs) on copper surface were investigated by atomic force microscopy (AFM) and electrochemical methods. The assembling process was monitored by AFM phase images. The assembling time influences the corrosion protection efficiency of dodecanethiol SAMs. Surface friction significantly decreases when the copper surface is covered by SAMs.