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RadTech 2012 Explores UV and EB Technologies in Manufacturing

机译:RadTech 2012探索制造业中的UV和EB技术

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摘要

CHICAGO - UV and EB technologies used across the spectrum of U.S. manufacturing were the focus of RadTech UV & EB Technology Expo & Conference, which took place April 30-May 2, 2012, in Chicago. The event featured technical conference presentations, eight end-user sessions and 77 exhibitors. Session topics included Graphic Arts; Barrier Coatings and Conductive Films for Flexible Electronics; Harsh Environments - Corrosion, Weathering and Exterior; Nanomaterials; LEDs; Rapid Field Applied; and Stereolithography.
机译:芝加哥-2012年4月30日至5月2日在芝加哥举行的RadTech UV&EB Technology Expo&Conference重点关注了在美国制造业中广泛使用的UV和EB技术。此次活动以技术会议演讲,八次最终用户会议和77家参展商为特色。会议主题包括图形艺术;柔性电子的阻隔涂层和导电膜;恶劣环境-腐蚀,风化和外部;纳米材料LED;快速现场应用;和立体光刻。

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