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Characterization of thorium dioxide thin films prepared by the spray pyrolysis technique

机译:喷雾热解技术制备的二氧化or薄膜的表征

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Thorium dioxide (ThO_2) thin films were deposited by the spray pyrolysis technique onto a glass substrate maintained in the temperature range 100-350 deg C by using thorium nitrate as a starting solution. Structural, morphological, optical and electrical properties have been investigated. The results of FTIR showed that thorium nitrate is completely decomposed to ThO_2 at 350 deg C, via two unstable intermediates. XRD patterns showed that the films deposited at T_s < 350 deg C were amorphous, whereas those deposited at higher temperatures crystallized in the cubic structure with a preferential orientation along the (111) direction. The film growth was investigated experimentally by atomic force microscopy (AFM). The dark resistivity was of the order of l0~6 OMEGA cm. The activation energy was found to be 0.81 eV. The optical parameters such as refractive index, absorption coefficient, energy gap width have also been determined. The energy of the effective dispersion oscillator and the dispersion energy which measures the average strength of interband optical transitions were found to be 6.62 and 3.04 eV, respectively, and the dielectric constant, epsilon_alpha, was found to be 3.17. The free-carrier concentration N_(opt) have also been determined.
机译:通过喷雾热解技术,通过使用硝酸(作为起始溶液,将二氧化ium(ThO_2)薄膜沉积在保持在100-350℃温度范围内的玻璃基板上。已经研究了结构,形态,光学和电学性质。 FTIR的结果表明,硝酸350在350℃下通过两个不稳定的中间体被完全分解为ThO_2。 XRD图谱表明,在Ts <350℃下沉积的膜是非晶的,而在较高温度下沉积的膜以立方结构结晶,并沿(111)方向优先取向。通过原子力显微镜(AFM)实验研究了膜的生长。暗电阻率约为10-6Ω·cm。发现活化能为0.81eV。还确定了光学参数,例如折射率,吸收系数,能隙宽度。发现有效色散振荡器的能量和测量带间光跃迁平均强度的色散能量分别为6.62和3.04 eV,介电常数epsilon_alpha为3.17。还确定了自由载流子浓度N_(opt)。

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