Direct Photolithographic Color Filter for 14.1-inch Flexible Color Electrophoretic Displays

摘要

A 14.1-inch flexible color electrophoretic display (EPD) has been fabricated successfully with the white reflectivity of 23.4%, contrast ratio of 8:1 and NTSC of 3.14%. The flexible color EPD device, in the main, involves a-Si thin-film transistors (TFTs) on a plastic substrate, microcup electrophoretic film and a quad-type color filter array pattern. To prevent the heat damage of EPD film and make the photolithography process possible, low temperature color resist have been developed, which requires only short pre-baking step of 80℃. This enables the possibility to produce a quad-type color filter array pattern directly on an EPD film. Here, we present a feasible and simple photolithography process to prepare color filter for color EPD application.