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首页> 外文期刊>Semiconductors >Effect of Pt, Pd, Au additives on the surface, in the bulk of tin dioxide thin films on the electrical, gas-sensitive properties
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Effect of Pt, Pd, Au additives on the surface, in the bulk of tin dioxide thin films on the electrical, gas-sensitive properties

机译:Pt,Pd,Au添加剂在表面,大量二氧化锡薄膜上对电,气敏性能的影响

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The microstructure and properties of thin (~100 nm) SnO _2 films with noble metals Pt, Pd, Au additives, grown by dc magnetron deposition are studied. It is shown that the introduction of additives into the bulk and the deposition of dispersed catalysts on the semiconductor surface make it possible to control the sensor parameters in pure air and upon exposure to reduction (CO, H _2, CH _4) and oxidation (NO _2) gases. Possible mechanisms for the effect of Pt, Pd, Au on the bulk and surface properties of tin dioxide are discussed. The technological conditions for film growth, which provide the selective detection of low concentrations (10-100 ppm) of CO and H _2, below-explosive concentrations (0. 5-2. 5 vol %) of methane, and trace concentrations (0. 05-5 ppm) of NO _2 are determined.
机译:研究了通过直流磁控管沉积法生长的具有贵金属Pt,Pd,Au添加剂的(〜100 nm)SnO _2薄膜的微观结构和性能。结果表明,将添加剂引入到主体中以及分散的催化剂在半导体表面上的沉积,可以控制纯净空气中以及暴露于还原(CO,H _2,CH _4)和氧化(NO)时的传感器参数。 _2)气体。讨论了Pt,Pd,Au对二氧化锡的体积和表面性能影响的可能机理。膜生长的技术条件,可以选择性检测低浓度(10-100 ppm)的CO和H _2,低于爆炸浓度(0. 5-2。5 vol%)的甲烷以及痕量浓度(0测定..05-5ppm)的NO _2。

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