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The role of fabrication techniques on the performance of widely tunable micromachined capacitors

机译:制造技术对广泛可调微机械电容器性能的作用

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摘要

Coventorware 2001.1(R) is used to identify key vertical dimensions for the low voltage operation of a two-gap widely tunable capacitor. Using identical masking stages, two varieties of tunable capacitor are presented. Nickel structures are demonstrated which have a tuning ratio of 5.1:1 from an initial capacitance of 0.7 pF. Gold devices exhibit a tuning ratio of 7.3:1 from an initial capacitance of 1.5 pF. These are the most widely tunable devices reported to date. (C) 2003 Elsevier B.V. All rights reserved. [References: 13]
机译:Coventorware 2001.1(R)用于识别两个间隙可广泛调谐的电容器在低压运行时的关键垂直尺寸。使用相同的掩蔽阶段,提出了两种可调电容器。已证明镍结构的初始电容为0.7 pF,调谐比为5.1:1。金器件的初始电容为1.5 pF,调谐比为7.3:1。这些是迄今为止报道的最广泛的可调设备。 (C)2003 Elsevier B.V.保留所有权利。 [参考:13]

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