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Magnetic microstructure and magnetoimpedance effect in NiFe/FeAlN multilayer films

机译:NiFe / FeAlN多层膜的磁微结构和磁阻效应

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摘要

The [NiFe (10 nm)/FeAlN (xnm)] multilayer films with 1 mu m thickness, where x was 10 nm, 50nm, 100 ran, and 200nm, respectively, were fabricated by magnetron sputtering method and the magnetoimpedance (MI) ratio of these films was measured. The magnetic structure shows that the dispersion of induced anisotropy is suppressed substantially in multilayer films due to the exchange coupling between NiFe and FeAIN sublayer. Results show that the MI ratio of the multilayer film with 50 mn thickness of FeAIN sublayer has maximum MI ratio. (c) 2007 Elsevier B.V. All rights reserved.
机译:通过磁控溅射法和磁阻(MI)比制备厚度为1μm的x [NiFe(10nm)/ FeAlN(xnm)]多层膜,其中x分别为10nm,50nm,100nm和200nm。测量了这些膜的厚度。磁性结构表明,由于NiFe和FeAIN子层之间的交换耦合,多层膜中感应各向异性的弥散基本上得到抑制。结果表明,FeAIN子层厚度为5,000 m的多层膜的MI比具有最大的MI比。 (c)2007 Elsevier B.V.保留所有权利。

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