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首页> 外文期刊>Scripta materialia >Surface Segregation Kinetics of Sulfur Influenced by Various Conditions in Thin-Gauged 3 percent Si-Fe Alloy Strips
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Surface Segregation Kinetics of Sulfur Influenced by Various Conditions in Thin-Gauged 3 percent Si-Fe Alloy Strips

机译:3%Si-Fe合金薄带中各种条件对硫的表面偏析动力学的影响

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摘要

The surface segregation kinetics of sulfur has been investigated in detail in 3 percent Si-Fe alloy strips. The segregation profile of sulfur mostly shows a maximum during annealing at 1200 deg C. The maximum surface concentration and the annealing time required to observe a certain concentration of segregated sulfur depend on hydrogen flow rate, heating rate and strip thickness.
机译:硫的表面偏析动力学已在3%的Si-Fe合金条中进行了详细研究。硫的偏析图大部分在1200℃退火期间显示最大值。观察到一定浓度的偏析硫所需的最大表面浓度和退火时间取决于氢气流速,加热速率和带材厚度。

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