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Preparation of hydroxyapatite coating on smooth implant surface by electrodeposition

机译:电沉积在光滑的种植体表面制备羟基磷灰石涂层

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摘要

A novel process for the deposition of a hydroxyapatite (HA) coating on a smooth implant surface has been developed. Specimens were firstly subjected to electrodeposition at -1.8 V (versus Ag/AgCl) in a mixed solution of 0.042 M Ca(NO_3)_2-4H_2O and 0.025 M NH_4H_2PO_4 at 85 °C for 5 s, and then post-treated in 1 M NaOH solution for 30 min. The experimental results showed the specimens prepared by the designed process to have better adhesion properties than those prepared by the traditional electrodeposition process.
机译:已经开发了在光滑的植入物表面上沉积羟基磷灰石(HA)涂层的新方法。首先在85°C下于0.042 M Ca(NO_3)_2-4H_2O和0.025 M NH_4H_2PO_4的混合溶液中于-1.8 V(相对于Ag / AgCl)对样品进行电沉积5 s,然后在1 M中进行后处理NaOH溶液30分钟。实验结果表明,与传统的电沉积工艺相比,通过设计工艺制备的样品具有更好的粘附性能。

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