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Infrared reflective properties of AZO/Ag/AZO trilayers prepared by RF magnetron sputtering

机译:射频磁控溅射制备的AZO / Ag / AZO三层膜的红外反射特性

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摘要

AZO/Ag/AZO trilayer films were prepared on glass substrates by radio frequency (RF) magnetron sputtering technology. Crystal structure, surface morphology, visible transmittance, and color scale of the AZO/Ag/AZO coated trilayers as functions of Ag and AZO layers thickness were investigated by X-ray Diffraction (XRD), Scanning Electron Microscope (SEM), Atomic Force Microscopy (AFM), optical transmittance spectra and CIELAB system. In addition, the electrical and infrared reflection properties of the coated trilayers were examined by four-point probe system and Fourier Transform Infrared Spectroscopy. The results indicated that the Ag inner layer started forming a continuous film at the thickness of 10 nm which was supported by XRD result of the distinct 200 and 220 Ag peaks. Besides, the highest average visible transmittance of 80.5% was obtained by the AZO (30 nm)/Ag (10 nm)/AZO (30 nm) structure. Furthermore, the lowest sheet resistivity of 4.36 n/sq and the highest infrared reflection rate of 96% in FIR region can be obtained by the AZO (30 nm)/Ag (13 nm)/AZ0 (30 nm) structure. The high infrared reflection property of the AZO/Ag/AZO trilayers makes it a promising candidate for energy conservation coatings.
机译:通过射频(RF)磁控溅射技术在玻璃基板上制备了AZO / Ag / AZO三层膜。通过X射线衍射(XRD),扫描电子显微镜(SEM),原子力显微镜研究了AZO / Ag / AZO涂层三层的晶体结构,表面形态,可见光透射率和色阶与Ag和AZO层厚度的关系(AFM),光透射光谱和CIELAB系统。另外,通过四点探针系统和傅里叶变换红外光谱法检查了涂覆的三层的电和红外反射性能。结果表明,Ag内层开始形成厚度为10 nm的连续膜,这由200和220个不同的Ag峰的XRD结果支持。此外,通过AZO(30nm)/ Ag(10nm)/ AZO(30nm)结构获得了最高的平均可见光透射率80.5%。此外,通过AZO(30 nm)/ Ag(13 nm)/ AZ0(30 nm)结构可以获得最低的4.36 n / sq薄层电阻率和FIR区域中96%的最高红外反射率。 AZO / Ag / AZO三层的高红外反射特性使其成为节能涂料的有前途的候选者。

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