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Effect of processing variables on the photocatalytic properties of ZnO thin films prepared using the polymeric precursor method

机译:加工变量对聚合物前驱体法制备的ZnO薄膜光催化性能的影响

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摘要

The preparation of ZnO thin films using the polymeric precursor method is reported, and the influence of the thickness and calcination temperature on their effective photocatalytic activity was analyzed. The ZnO thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), diffuse reflectance UV-vis spectroscopy (UV-DRS), and atomic force microscopy (AFM). Thicker films with a lower calcination temperature exhibited better photoactivity for RhB photodegradation under UV irradiation. The average particle size increased from 14 to 45 nm as the calcination temperature increased from 400 to 600 degrees C. In addition, the stability results indicated no significant deactivation even after four successive re-uses in RhB photodegradation. (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译:报道了用聚合物前驱体方法制备ZnO薄膜,并分析了厚度和煅烧温度对其有效光催化活性的影响。 ZnO薄膜的特征在于X射线衍射(XRD),扫描电子显微镜(SEM),漫反射紫外可见光谱(UV-DRS)和原子力显微镜(AFM)。较低的煅烧温度的较厚膜在紫外线照射下对RhB光降解表现出更好的光活性。随着煅烧温度从400摄氏度增加到600摄氏度,平均粒径从14纳米增加到45纳米。此外,稳定性结果表明,即使连续四次重复使用RhB光降解后,稳定性也没有明显降低。 (C)2015 Elsevier Ltd和Techna Group S.r.l.版权所有。

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