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Atomic Layer Deposition of ZnO Thin Films on ZSM-5 Zeolite and Its Catalytic Performance in Chichibabin Reaction

机译:ZSM-5分子筛上ZnO薄膜的原子层沉积及其在Chichibabin反应中的催化性能

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摘要

A series of ZnO thin film modified ZSM-5 zeolites was prepared by atomic layer deposition (ALD) method with different ALD cycle numbers. These samples were characterized by nitrogen adsorption-desorption, ICP-AES, XPS, TEM and NH3-TPD techniques. The results of these characterizations showed that the thin film was ZnO, which was deposited on the surface of ZSM-5, especially the edge. The surface and pores of ZSM-5 was covered progressively by the increase of ALD cycles. By relating the Zn content of each cycle to the characters of ALD method, a deposition model of ZnO on ZSM-5 substrate was deduced. The surface acidity of the prepared samples can be tuned by adjusting the ALD cycle number as well. The catalytic properties of these samples were evaluated in Chichibabin reaction of acetaldehyde and ammonia. They could not only highly enhance the total yield of pyridine bases, but also could change the product distribution.
机译:采用原子层沉积(ALD)法制备了一系列具有不同ALD循环数的ZnO薄膜改性ZSM-5分子筛。这些样品通过氮吸附-解吸,ICP-AES,XPS,TEM和NH3-TPD技术进行了表征。这些表征的结果表明,薄膜为ZnO,其沉积在ZSM-5的表面,尤其是边缘上。 ZSM-5的表面和孔被ALD循环的增加逐渐覆盖。通过将每个循环的Zn含量与ALD方法的特性联系起来,推导了ZnO在ZSM-5衬底上的沉积模型。制备的样品的表面酸度也可以通过调节ALD循环数来调节。在Chichibabin乙醛和氨的反应中评估了这些样品的催化性能。它们不仅可以大大提高吡啶碱的总产率,而且可以改变产物的分布。

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