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Effects of SrTiO_(3)/TiO_(2) buffer layer on structural and electrical properties of BiFeO_(3) thin films grown on GaN (0002)

机译:SrTiO_(3)/TiO_(2)缓冲层对GaN(0002)上生长的BiFeO_(3)薄膜结构和电学性能的影响

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摘要

BiFeO_(3)(BFO) films were deposited by pulsed laser deposition on GaN(0002)/c-sapphire. X-ray diffraction data show that BFO(111) epitaxial films was deposited on SrTiO_(3)/TiO_(2) double-layer buffered GaN, compared to the polycrystalline film grown directly on GaN. The epitaxial relationships of BFO film with SrTiO_(3)/TiO_(2) buffer layers were BFO 11-2(111)//GaN 1-100(0002) as revealed by XRD phi scans. Furthermore, BFO films on SrTiO_(3)/TiO_(2) buffer exhibited enhanced electric properties compared to these deposited directly on GaN. The remnant polarization was improved about 30percent while the leakage current was reduced by nearly three orders of magnitude. The epitaxial growth promoted by the SrTiO_(3)/TiO_(2) buffer layer is a pivotal parameter in the improved electric properties of BFO films on GaN (0002).
机译:BiFeO_(3)(BFO)薄膜采用脉冲激光沉积法沉积在GaN(0002)/c-蓝宝石上。X射线衍射数据显示,与直接生长在GaN上的多晶薄膜相比,BFO(111)外延薄膜沉积在SrTiO_(3)/TiO_(2)双层缓冲GaN上。XRD phi扫描显示,BFO薄膜与SrTiO_(3)/TiO_(2)缓冲层的外延关系为BFO[11-2](111)//GaN [1-100](0002)。此外,与直接沉积在GaN上的BFO薄膜相比,SrTiO_(3)/TiO_(2)缓冲液上的BFO薄膜表现出更强的电性能。残余极化改善了约30%,而漏电流降低了近三个数量级。SrTiO_(3)/TiO_(2)缓冲层促进的外延生长是改善BFO薄膜在GaN(0002)上的电性能的关键参数。

著录项

  • 来源
    《Journal of Applied Physics》 |2011年第10期|104108-1-104108-5|共5页
  • 作者单位

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 应用物理学;
  • 关键词

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