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首页> 外文期刊>Nanoscience and Nanotechnology Letters >Thickness-Dependent Thermal Conductivity of Annealed n-Bi2Te3 and p-Bi0.5Sb1.5Te3 Thin Films and Theoretical Analysis
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Thickness-Dependent Thermal Conductivity of Annealed n-Bi2Te3 and p-Bi0.5Sb1.5Te3 Thin Films and Theoretical Analysis

机译:n-Bi2Te3和p-Bi0.5Sb1.5Te3退火薄膜的厚度依赖性导热系数及理论分析

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We report on the thickness-dependent thermal conductivities of n-type bismuth telluride ( Bi2Te3) and p-type bismuth antimony telluride ( Bi0.5Sb1.5Te3) thin films using modified Callaway and Sondheimer models. In this study, Bi2Te3 thin films with thicknesses of 100, 300, and 420 nm and Bi0.5Sb1.5Te3 thin films with thicknesses of 100, 300, and 780 nm were prepared using radio-frequency magnetron sputtering. The average thermal conductivities of the Bi2Te3 and Bi0.5Sb1.5Te3 thin films were determined to range from 0.38 to 0.96 and from 0.26 to 0.59W/m.K at 300 K, respectively, using the four-point-probe 3-omega method. The experimental results, including the thickness-dependent thermal conductivities of the Bi2Te3 and Bi0.5Sb1.5Te3 thin films, were further analyzed using both modified Callaway and Sondheimer models, which showed good agreement with the experimental results. This result implies that the thermal conductivity of the films is significantly reduced compared with the bulk values because of the enhanced phonon scattering in thin films. We have confidence that this theoretical analysis could significantly contribute to further understanding of thermal transport in thin films.
机译:我们报告了使用改进的Callaway和Sondheimer模型的n型碲化铋(Bi2Te3)和p型碲化铋锑(Bi0.5Sb1.5Te3)薄膜的厚度依赖性导热系数。在这项研究中,使用射频磁控溅射制备了厚度分别为100、300和420 nm的Bi2Te3薄膜和厚度分别为100、300和780 nm的Bi0.5Sb1.5Te3薄膜。使用四点探针3欧姆法测得的Bi2Te3和Bi0.5Sb1.5Te3薄膜的平均热导率分别在300 K下为0.38至0.96和0.26至0.59W / m.K。实验结果,包括改进的Callaway模型和Sondheimer模型,进一步分析了Bi2Te3和Bi0.5Sb1.5Te3薄膜的厚度依赖性导热系数,与实验结果吻合良好。该结果表明,由于增强的声子在薄膜中的散射,与整体值相比,薄膜的热导率显着降低。我们相信,这种理论分析可以极大地有助于进一步理解薄膜中的热传输。

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