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Fabrication of metallic nanowires and nanoribbons using laser interference lithography and shadow lithography

机译:使用激光干涉光刻和阴影光刻技术制造金属纳米线和纳米带

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摘要

Ordered and free-standing metallic nanowires were fabricated by e-beam deposition on patterned polymer templates made by interference lithography. The dimensions of the nanowires can be controlled through adjustment of deposition conditions and polymer templates. Grain size, polarized optical transmission and electrical resistivity were measured with ordered and free-standing nanowires.
机译:通过电子束沉积在通过干涉光刻法制成的图案化聚合物模板上,制造出有序且独立的金属纳米线。可以通过调整沉积条件和聚合物模板来控制纳米线的尺寸。用有序和独立的纳米线测量了晶粒尺寸,偏振光透射率和电阻率。

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