Nanosieves with microsystem technology for microfiltration applications

摘要

A nanosieve with a very uniform pore size of 260 nm and a pore-to-pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micromachining technology. The nanosieve filter consists of a 0.1 mu m thick silicon nitride membrane perforated with submicron diameter pores and a macroperforated inorganic silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes. [References: 11]