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Thickness dependence of the microstructures and magnetic properties of electroplated Co nanowires

机译:电镀Co纳米线的微观结构和磁性能的厚度依赖性

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The correlation between the crystal structure and the magnetic properties of Co nanowires of diameter 65 and 200 nm fabricated by electroplating Co into the pores of anodic aluminum oxide membranes has been investigated. Strikingly different microstructures have been observed in these Co nanowires by means of x-ray diffraction and selected area electron diffraction measurements. The 65 nm thick Co nanowires are composed of long and ordered hexagonal close-packed Co grains (> 5 mu m), while the 200 nm thick Co nanowires are composed of submicron-long hexagonal close-packed and face-centered cubic Co grains. Correspondingly, different magnetic properties have been observed for these Co nanowires. Magnetization measurements have found that the 65 nm thick Co nanowires have a magnetic hysteresis that is significantly larger than that of the 200 nm thick Co nanowires. Spontaneous magnetic moments of the nanowires are parallel to the nanowires in the 65 nm thick Co nanowires, but they are transverse to the nanowires in the 200 nm thick Co nanowires, as observed by the magnetic force microscopy. The correlation between their different magnetic properties and microstructures is discussed.
机译:研究了通过在阳极氧化铝膜的孔中电镀Co制备的直径为65和200 nm的Co纳米线的晶体结构与磁性之间的相关性。通过X射线衍射和选定区域电子衍射测量,在这些Co纳米线中观察到了惊人的不同微观结构。 65 nm厚的Co纳米线由长且有序的六方密堆积Co晶粒(> 5μm)组成,而200 nm厚的Co纳米线由亚微米长的六方密堆积且面心立方Cu晶粒组成。相应地,对于这些Co纳米线已经观察到不同的磁性。磁化测量发现,厚度为65 nm的Co纳米线的磁滞明显大于厚度为200 nm的Co纳米线的磁滞。通过磁力显微镜观察,纳米线的自发磁矩与65 nm厚的Co纳米线中的纳米线平行,但与200 nm厚的Co纳米线中的纳米线垂直。讨论了它们不同的磁性和微观结构之间的关系。

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