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Cathodoluminescence microanalysis of silica and amorphized quartz

机译:二氧化硅和非晶石英的阴极发光微分析

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摘要

Cathodoluminescence (CL) techniques are used to investigate the defect structures of pure synthetic silicon dioxide (SiO_2) polymorphs. Pure, synthetic Types I, II, III and IV amorphous SiO_2 polymorphs, pure, synthetic crystal -SiO_2 and pure, synthetic amorphized crystal -SiO_2 have been investigated and their characteristic defects have been determined and compared. The CL emission from pure SiO_2 polymorphs is generally related to local point defects in the tetrahedrally coordinated SiO_2 host lattice. A range of CL emissions associated with non bridging oxygen defects, oxygen deficient defects and the radiative recombination of self trapped excitons are observed from both the pure synthetic crystal and amorphous SiO_2 polymorphs. In addition CL emissions associated with residual concentrations of Aluminium impurities are also observed from -SiO_2 (quartz) and Type I and II a-SiO_2 (fused quartz). Localised amorphous micro-volumes may exist within natural -SiO_2 due to the presence of a high concentration of pre-existing or induced defects. Amorphization of -SiO_2 diminishes the difference between the defect structures and associated CL from -SiO_2 and a-SiO_2. Thus CL investigation of the defect structure of a-SiO_2 polymorphs provides useful insight into the microstructure of amorphized -SiO_2.
机译:阴极发光(CL)技术用于研究纯合成二氧化硅(SiO_2)多晶型物的缺陷结构。研究了纯的,合成的I,II,III和IV型非晶SiO_2多晶型物,纯的合成晶体-SiO_2和纯的合成非晶态晶体-SiO_2,并确定了它们的特征缺陷并进行了比较。纯SiO_2多晶型物的CL发射通常与四面体配位的SiO_2主晶格中的局部缺陷有关。从纯合成晶体和无定形SiO_2多晶型物均观察到与非桥接氧缺陷,氧缺陷缺陷和自陷激子的辐射复合相关的一系列CL发射。此外,还从-SiO_2(石英)和I和II型a-SiO_2(熔融石英)中观察到与铝杂质残留浓度有关的CL发射。由于存在高浓度的预先存在或诱发的缺陷,局部非晶态微体积可能存在于天然-SiO_2中。 -SiO_2的非晶化减小了缺陷结构与相关的CL与-SiO_2和a-SiO_2之间的差异。因此,对α-SiO_2多晶型物缺陷结构的CL研究提供了有用的见识,有助于了解非晶化-SiO_2的微观结构。

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