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The anomalous behavior and properties of Ni-Co films codeposited in the sulfamate-chloride electrolyte

机译:共沉积在氨基磺酸氯化物电解质中的Ni-Co膜的异常行为和性能

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In this paper, we have studied the effect of controlled parameters on the anomalous behavior and property of the codeposited nickel-cobalt (Ni-Co) films in the complex sulfamate-chloride bath. The variation of current densities and temperature resulted in different Co atomic percentage (Co at%) of the deposited films as well as the morphology and microhardness. Co at% in Ni-Co films gradually decreased with increasing current density and temperatures with variation from approximately 25 to 15%. The Co participation could also inhibit grain growth of the deposited films. The Ni-Co film codeposited at lower current density or temperature would have the higher hard Co content and smaller grain which results in the higher microharness and smooth morphology.
机译:在本文中,我们研究了受控参数对复合氨基磺酸盐酸盐浴中共沉积镍钴(Ni-Co)膜的异常行为和性能的影响。电流密度和温度的变化导致沉积膜的Co原子百分比(Co at%)不同,并且形貌和显微硬度也不同。随着电流密度和温度的增加,Ni-Co膜中的Co at%逐渐降低,变化范围约为25%至15%。 Co的参与还可以抑制沉积膜的晶粒生长。共沉积在较低电流密度或温度下的Ni-Co膜将具有较高的硬Co含量和较小的晶粒,从而导致较高的微线束和光滑的形貌。

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