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A self-aligned fabrication method of dual comb drive using multilayers SOI process for optical MEMS applications

机译:一种用于光学MEMS应用的使用多层SOI工艺的双梳状驱动器的自对准制造方法

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摘要

A novel method for fabricating a self-aligned electrostatic dual comb drive using a multi-layer SOI process is developed. The present method utilizes four aligned masks, greatly simplify the existing SOI-MEMS fabrication methods in manufacturing optical MEMS devices. Here, the actuating structure consists of fixed combs and moving combs that are composed of single crystal silicon, nitride and polysilicon. One mask is used to provide a deep etching to etch polysilicon, nitride and single crystal silicon respectively. The nitride separates polysilicon and single crystal silicon and provides an additional dielectric for the purpose of producing bi- directional motion upon applying electrostatic forces. A dual comb drive actuator with optical structures was fabricated with the developed process. The actuator is capable of motion 250 nm downward and 480 nm upward with 30 V applied voltage at 4 kHz frequency. The dynamic characteristics of the first and the second resonant frequency of the dual comb-drive actuator are 10.5 kHz and 23 kHz respectively. Experimental results indicated that the measured data agreed well with simulation results using the ANSOFT Maxwell 2D field simulator, ANSYS and Coventor Ware.
机译:开发了一种使用多层SOI工艺制造自对准静电双梳齿驱动器的新颖方法。本方法利用四个对准的掩模,大大简化了在制造光学MEMS器件中现有的SOI-MEMS制造方法。在此,致动结构由固定梳和移动梳组成,固定梳和移动梳由单晶硅,氮化物和多晶硅组成。一个掩模用于提供深蚀刻以分别蚀刻多晶硅,氮化物和单晶硅。氮化物将多晶硅和单晶硅分开,并提供附加的电介质,以便在施加静电力时产生双向运动。利用开发的工艺制造了具有光学结构的双梳齿驱动器。在30 kHz的施加电压下,致动器能够以4 kHz的频率向下运动250 nm,向上运动480 nm。双梳齿驱动致动器的第一和第二谐振频率的动态特性分别为10.5 kHz和23 kHz。实验结果表明,使用ANSOFT Maxwell 2D现场模拟器,ANSYS和Coventor Ware,测量数据与模拟结果非常吻合。

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