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首页> 外文期刊>Mikrochimica Acta: An International Journal for Physical and Chemical Methods of Analysis >Detection of short ssDNA and dsDNA by current-voltage measurements using conical nanopores coated with Al2O3 by atomic layer deposition
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Detection of short ssDNA and dsDNA by current-voltage measurements using conical nanopores coated with Al2O3 by atomic layer deposition

机译:使用原子层沉积涂覆有Al2O3的锥形纳米孔通过电流-电压测量检测短ssDNA和dsDNA

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摘要

DNA detection using solid state nanopores is limited by the difficulty of the detection of short DNA strands due to their very short dwell time. Here, we report on the fabrication of nanopores using a track-etching technique along with the atomic layer deposition of aluminum oxide. This method allows shaping of conical nanopores, controlling their diameter, and passivation of the surface by Al2O3. Through the optimized nanopore, short DNA (10 nM) having 10 and 40 nucleotides in length were detected both at the single stranded and double stranded levels. The analysis of current trace shows signal to noise ratio of 2 and 4 for ssDNA and dsDNA respectively and a dwell time at ms scale. This is possible because of both the high aspect ratio and the Al2O3 coating that permit to decrease the DNA velocity.
机译:使用固态纳米孔的DNA检测由于其短的停留时间而难以检测短的DNA链,因此受到限制。在这里,我们报道了使用轨迹蚀刻技术与氧化铝的原子层沉积一起制造纳米孔的过程。这种方法可以使圆锥形纳米孔成形,控制其直径并通过Al2O3钝化表面。通过优化的纳米孔,可以在单链和双链水平上检测到长度分别为10和40个核苷酸的短DNA(10 nM)。对电流迹线的分析显示,ssDNA和dsDNA的信噪比分别为2和4,并且停留时间为ms级。由于高的长宽比和允许降低DNA速度的Al2O3涂层,这是可能的。

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