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A review on photocatalytic application of g-C3N4/semiconductor (CNS) nanocomposites towards the erasure of dyeing wastewater

机译:g-C3N4 /半导体(CNS)纳米复合材料在光催化降解印染废水中的光催化应用研究进展

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摘要

Widespread concerns about the impacts of exposure to chemical substances with textile dyeing activities continue to be raised. Hitherto, the percolation of synthetic colourants into the groundwater and surface water supply remains an intricate challenge abroad the nations. With the revolution of graphitic carbon nitride (g-C3N4), there has been a gradually increasing attention in this research area. Recent advancements have been demonstrated that g-C3N4/semiconductor (CNS) nanocomposites can be envisioned as the most privileged and promising novel catalysts in the photocatalytic destruction of industrial effluents. The paper presents a review of current state of art on photocatalytic destruction of dyestuff effluents via CNS nanocomposites. Numerous techniques used to synthesize the CNS nanocomposites together with their representative examples have been reviewed. In addition, the recent research progresses on the efficacy of these nanocomposites in removing of selected dye pollutants are also summarized. This review paper ends with a summary and several future prospects on the challenges in expanding g-C3N4-based advanced nanocomposites in the possible enhancement of environmental conservation. (C) 2016 Elsevier Ltd. All rights reserved.
机译:人们继续担心接触化学物质对纺织品染色活动的影响。迄今为止,合成着色剂渗透到地下水和地表水中仍然是各国面临的复杂挑战。随着石墨氮化碳(g-C3N4)的革命,该研究领域逐渐受到关注。最近的进展已证明,g-C3N4 /半导体(CNS)纳米复合材料可被视为工业废水的光催化破坏中最优先和最有前途的新型催化剂。本文介绍了通过CNS纳米复合材料光催化降解染料废水的最新技术。综述了用于合成CNS纳米复合材料的众多技术及其代表性实例。另外,还总结了这些纳米复合材料在去除所选染料污染物中的功效方面的最新研究进展。这篇综述论文总结了在基于g-C3N4的先进纳米复合材料的发展中可能带来的环境保护方面所面临的挑战,并总结了一些未来前景。 (C)2016 Elsevier Ltd.保留所有权利。

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