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Effect of annealing on tensile properties of electrodeposited nanocrystalline Ni with broad grain size distribution

机译:退火对宽粒度分布电沉积纳米晶Ni拉伸性能的影响

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摘要

The microstructures and tensile properties of electrodeposited nanocrystalline Ni (nc-Ni) with a broad grain size distribution after annealing at 150, 200 and 300°C for 500 s were investigated. The as deposited broad grain size distribution nc-Ni sample exhibited a moderate strength σ_(UTS) of -1107 MPa but a markedly enhanced ductility ε_(TEF) of -10%, compared with electrodeposited nc-Ni with a narrow grain size distribution. Annealing below 200°C increased the strength but caused a considerably reduction in tensile elongation. This behaviour is attributed to the grain boundary relaxation and the increased order of grain boundaries after annealing, which can make the grain boundary activities, such as the grain boundary sliding and grain rotations, more difficult. Further annealing at 300°C decreased both the yield strength and tensile elongation significantly due to significant grain growth.
机译:研究了在150、200和300°C退火500 s后具有宽晶粒尺寸分布的电沉积纳米晶Ni(nc-Ni)的微观结构和拉伸性能。与电沉积的具有窄晶粒尺寸分布的nc-Ni相比,所沉积的宽晶粒尺寸分布nc-Ni样品具有-1107 MPa的中等强度σ_(UTS),但-10%的延展性ε_(TEF)显着提高。低于200°C退火可提高强度,但会导致拉伸伸长率显着降低。此行为归因于晶界松弛和退火后晶界的增加顺序,这会使晶界活动(如晶界滑动和晶粒旋转)更加困难。由于明显的晶粒生长,在300°C下进一步退火会显着降低屈服强度和拉伸伸长率。

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