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Preparation of porous Ni-YSZ coatings by EB-PVD

机译:EB-PVD制备多孔Ni-YSZ涂层

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摘要

Porous Ni-8YSZ (zirconia stabilised by 8 mol- percent yttria) coatings were prepared by electron beam physical vapour deposition (EB-PVD) technique with a high deposition rate of 2 mu m min~(-1) via simultaneously evaporating the ingots of metal Ni and 8YSZ. The coating composition showed a significant dependence on the deposition position in vacuum chamber. The porosity, hardness and electrical conductivity of the coating were severely influenced by Ni content in this coating. The SEM and TEM observations exhibited that the coating presented a distinct columnar structure and many pores were uniformly dispersed at the boundaries of the columns. A Brunauer, Emmet and Teller analysis demonstrated that the average diameter of the pores in this coating was 25 nm and the coating had a high specific surface area of 3.232 m~2 g~(-1).
机译:通过电子束物理气相沉积(EB-PVD)技术,同时蒸发硅锭,以2μmmin〜(-1)的高沉积速率制备了多孔的Ni-8YSZ(氧化锆,氧化钇稳定度为8 mol%)。金属镍和8YSZ。该涂料组合物显示出对真空室中沉积位置的显着依赖性。镀层中的镍含量严重影响镀层的孔隙率,硬度和电导率。 SEM和TEM观察表明,涂层呈现出独特的柱状结构,并且许多孔均匀地分散在柱的边界处。 Brunauer,Emmet和Teller分析表明,该涂层中的孔的平均直径为25nm,并且该涂层具有3.232m〜2g〜(-1)的高比表面积。

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