Effect of oxygen gas addition on preparation of iridium and platinum films by metal-organic chemical vapor deposition

摘要

The effect of oxygen gas addition on deposition rates, composition and microstructure was investigated in preparing Ir and Pt films by metal-organic chemical vapor deposition using Ir- and Pt-acetylacetonate precursors. Without the addition ofoxygen gas, 20 mass% of carbon at most was contained in the films. The carbon was amorphous, surrounding metal particles of several nanometers in diameter. The addition of oxygen gas is effective in obtaining carbon-free Ir and Pt films, and the filmsgrow epitaxially on MgO and sapphire single crystal substrates.