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首页> 外文期刊>Materiali in Tehnologije >THE EFFECT OF BIAS VOLTAGE ON OXIDATION BEHAVIOR OF MONOLAYER TiAlN AND MULTILAYER TiAlN/AlN COATINGS
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THE EFFECT OF BIAS VOLTAGE ON OXIDATION BEHAVIOR OF MONOLAYER TiAlN AND MULTILAYER TiAlN/AlN COATINGS

机译:偏压对单层TiAlN和多层TiAlN / AlN涂层氧化行为的影响

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摘要

TiAlN coatings have been known to be superior to other coatings such as TiN and TiCN in protecting tools which may be damaged by high thermal load. It is well known that multi-layered coatings indicates better thermo/mechanical properties than mono layered coatings. Monolayer TiAlN coating have less oxidation resistance than multilayer TiAlN/ AlN coatings. In this study, TiAlN/AlN multi layer coatings were deposited at different bias (self bias, -30V, -60V) voltages by the method of physical vapor deposition (d.c. magnetron sputtering) on steel substrates. Experimentally all coatings are oxidized as isothermals for 1 hour at 800 deg C to inspect oxidation of the films. Then oxidised surfaces were characterized by optic microscopy, electron micsroscopy (SEM) and EPMA. Crystal structure were analyzed using XRD. It was found that bias voltage increase to the coating density and oxidation resistance.
机译:已知在保护工具中,TiAlN涂层优于其他涂层,例如TiN和TiCN,这些涂层可能会因高热负荷而损坏。众所周知,多层涂层比单层涂层具有更好的热/机械性能。单层TiAlN涂层的抗氧化性低于多层TiAlN / AlN涂层。在这项研究中,通过物理气相沉积(直流磁控溅射)方法在钢基底上以不同的偏压(自偏压,-30V,-60V)沉积TiAlN / AlN多层涂层。实验上,将所有涂层在800摄氏度下等温氧化1小时,以检查薄膜的氧化情况。然后通过光学显微镜,电子显微镜(SEM)和EPMA对氧化的表面进行表征。使用XRD分析晶体结构。发现偏置电压增加了涂层的密度和抗氧化性。

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