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XPS AND AES STUDIES OF FERROELECTRIC (Pb,La)TiO_3 THIN FILMS PREPARED BY RF MAGNETRON SPUTTERING TECHNIQUE

机译:射频磁控溅射技术制备(Pb,La)TiO_3铁电薄膜的XPS和AES研究

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摘要

X-ray photoelectron spectroscopy as well as Auger electron spectroscopy studies were used for determining the chemical composition, compositional depth profile, and the chemical bonding of ferroelectric (Pb,La)TiO_3 thin films deposited by RF magnetron sputtering technique. It was found that the chemical composition of the films and the chemical bondings of titanium in the near surface region are different from those in the "bulk" region of the films. The titanium atoms exist mainly in the forms of TiO and PbTiO_3 in the near surface region, whereas in the bulk region, the chemical composition is in good agreement with stoichiometry and titanium atoms exist in the form of PbTiO_3. The lead atoms exists in the form of PbTiO_3 near the surface and in the "bulk" of the films.
机译:利用X射线光电子能谱和俄歇电子能谱研究来确定通过RF磁控溅射技术沉积的铁电(Pb,La)TiO_3薄膜的化学组成,组成深度分布以及化学键合。发现在近表面区域中膜的化学组成和钛的化学键与在膜的“本体”区域中的化学键和钛的化学键不同。钛原子在近表面区域主要以TiO和PbTiO_3的形式存在,而在本体区域,化学组成与化学计量关系很好,钛原子以PbTiO_3的形式存在。铅原子以PbTiO_3的形式存在于表面附近和薄膜的“本体”中。

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