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Modified Vinyl-POSS Materials as Sun Protection Factor and as Films for Greenhouse Cover

机译:改性乙烯基-POSS材料作为防晒因子和温室覆盖膜

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摘要

In this work, modified vinyl-[polyhedral oligomeric silsesquioxane (POSS)] (VP) materials as sun protection factor and as films for greenhouse cover to protect from ultraviolet (UV) were explored. Based on VP and modified with various amounts of tetraethoxy si-lane (TEOS), POSS-modified films f-VPT_(i vt.%) were prepared. The average transparency (AT) of the films measured at the ranges of UV-A (320-400 nm) and the UV-B (280-320 nm) spectra was about 45.43-48.71%, indicating that these films can provide a physical barrier to block UV-A and UV-B absorptions (causing human skin cancer and damaging photosynthesis of plants) by the skin and by plants in a green house. The under 25 wt-% TEOS additions result in the hybrid structure containing SiO_2 which causes an increase in the AT radiation from sunlight. This increase tendency was validated using calculations of the density of state and the energy-band structure of both VP and SiO_2 building blocks by the Materials Stutio software. The less transparency of VP can be ascribed to its much narrower forbidden band.
机译:在这项工作中,探索了改性乙烯基-[多面体低聚倍半硅氧烷(POSS)](VP)材料作为防晒因子和温室保护膜以防紫外线(UV)。基于VP并用各种量的四乙氧基硅烷(TEOS)修饰,制备了POSS修饰的膜f-VPT_(IV%)。在UV-A(320-400 nm)和UV-B(280-320 nm)光谱范围内测得的薄膜平均透明度(AT)约为45.43-48.71%,表明这些薄膜可以提供物理阻止皮肤和温室中的植物吸收UV-A和UV-B的障碍(导致人类皮肤癌和破坏植物的光合作用)。低于25 wt%的TEOS添加量会导致包含SiO_2的杂化结构,从而导致来自太阳光的AT辐射增加。通过使用材料Stutio软件计算VP和SiO_2结构单元的态密度和能带结构,可以验证这种增长趋势。 VP透明度较低的原因是其禁带范围更窄。

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