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首页> 外文期刊>Bulletin of the Russian Academy of Sciences. Physics >GROWTH OF DIAMOND-LIKE FILMS ON SUBSTRATES OF DIFFERENT TYPES BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION
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GROWTH OF DIAMOND-LIKE FILMS ON SUBSTRATES OF DIFFERENT TYPES BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

机译:等离子体增强化学气相沉积法在不同类型基质上的类金刚石薄膜的生长

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摘要

Diamond-like carbon films were deposited on substrates made of various materials and having different shapes by plasma-enhanced chemical vapor deposition. The coatings obtained on planar substrates had good adhesion and hardness exceeding 50 GPa. On spherical substrates, films of good quality were obtained only near the vertex (where the substrate and electrode surfaces are parallel to each other). This effect is related to the influence of ion bombardment on the film growth
机译:通过等离子体增强化学气相沉积将类金刚石碳膜沉积在由各种材料制成且形状不同的基板上。在平面基材上获得的涂层具有良好的附着力和超过50 GPa的硬度。在球形基板上,仅在顶点附近(基板和电极表面彼此平行)才能获得高质量的膜。此效应与离子轰击对薄膜生长的影响有关

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