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Synthesis and characterization of anionic pentablock brush copolymers bearing poly(acrylic acid) side chains on the brush blocks separated by linear poly(butyl methacrylate) blocks

机译:阴离子型五嵌段刷共聚物的合成与表征,该共聚物在线型聚甲基丙烯酸丁酯嵌段隔开的刷嵌段上带有聚(丙烯酸)侧链

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摘要

One-pot successive three-step RAFT polymerization of 2-hydroxyethyl methacrylate (HEMA) and butyl methacrylate (BMA) in the presence of difunctional RAFT CTA is reported demonstrating successful synthesis of pentablock copolymers containing hydrophilic blocks of pHEMA separated by hydrophobic blocks of pBMA. Dispersity of pentablock copolymers was lower than that of pHEMA and triblock copolymers, down to 1.11. pHEMA blocks of the pentablock copolymer were decorated by pendent butylthiocarbonothioylthio moieties, which served as multiple RAFT CTA for grafting of acrylic acid (AA). The resulting anionic pentablock brush copolymers consisting of three brush blocks separated by linear blocks were characterized by SEC with triple detection and H-1 NMR spectroscopy. Pentablock brush copolymers with short pAA side chains produced aggregates at low pH and showed conformational changes during titration with alkaline solution, while those with medium-length pAA side chains showed ionization behavior typical for anionic molecular brushes. Anionic pentablock brush copolymers are mimicking naturally occurring molecular brushes and deserve attention as potential surface modifiers and lubricants. (C) 2015 Elsevier Ltd. All rights reserved.
机译:据报道,在双官能团RAFT CTA存在下,一锅法连续的三步甲基丙烯酸2-羟乙酯和甲基丙烯酸丁酯(BMA)的RAFT聚合反应表明,成功合成了五嵌段共聚物,该共聚物包含被pBMA的疏水嵌段分开的pHEMA亲水嵌段。五嵌段共聚物的分散度低于pHEMA和三嵌段共聚物的分散度,低至1.11。五嵌段共聚物的pHEMA嵌段由侧丁基硫代羰基硫代硫基硫基部分修饰,该部分用作丙烯酸(AA)接枝的多个RAFT CTA。通过具有三重检测和H-1 NMR光谱的SEC对由三个被线性嵌段分开的刷嵌段组成的阴离子五嵌段刷共聚物进行表征。具有短pAA侧链的Pentablock刷共聚物在低pH值下会产生聚集体,并在用碱溶液滴定期间显示构象变化,而具有中等长度pAA侧链的共聚物显示出阴离子分子刷典型的电离行为。阴离子五嵌段刷共聚物正在模仿天然存在的分子刷,作为潜在的表面改性剂和润滑剂值得关注。 (C)2015 Elsevier Ltd.保留所有权利。

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