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Photo-electrochemical and impedance investigation of passive layers grown anodically on titanium alloys

机译:钛合金上阳极生长的钝化层的光电化学和阻抗研究

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The anodic behaviour of two titanium cast alloys, obtained by fusion in a voltaic arc under argon atmosphere, was analyzed in aerated aqueous solutions having different pH values. In all solutions the alloys, having nominal compositions Ti-50Zr at.% and Ti-13Zr-13Nb wt.%, displayed a valve-metal behaviour, owing to the formation of barrier-type oxide films. Passive films, grown potentiodynamically up to about 9 V, were investigated by photocurrent spectroscopy (PCS) and electrochemical impedance spectroscopy (EIS). These passive layers show photoactivity under anodic polarizations, with optical gaps close to 3.55 and 3.25 eV for the binary and the ternary alloy, respectively, independent of the anodizing electrolyte. Films grown on the binary alloy present insulating behaviour and anodic impedance spectra with one time constant; this was interpreted in terms of a single-layer mixed Ti-Zr oxide enriched in Ti with respect to the alloy composition. Also for the ternary alloy the results are consistent with the formation, upon anodization, of Ti-Nb-Zr mixed oxide films, but they display n-type semiconducting behaviour, owing to their poor content of ZrO{sub}2 groups.
机译:在具有不同pH值的充气水溶液中分析了两种钛铸合金的阳极行为,这些合金是通过在氩气气氛下在电弧中熔化而获得的。在所有溶液中,由于形成势垒型氧化膜,标称成分为Ti-50Zr at。%和Ti-13Zr-13Nb wt。%的合金表现出阀金属性能。通过光电流能谱法(PCS)和电化学阻抗能谱法(EIS)研究了在动电势最高达9 V的条件下生长的无源薄膜。这些钝化层在阳极极化下表现出光活性,二元和三元合金的光学间隙分别接近3.55和3.25 eV,与阳极氧化电解质无关。在二元合金上生长的膜具有一个时间常数的绝缘行为和阳极阻抗谱。这是根据相对于合金成分而言富含Ti的单层混合Ti-Zr氧化物来解释的。同样对于三元合金,结果与在阳极氧化时形成Ti-Nb-Zr混合氧化物膜是一致的,但是由于它们的ZrO {sub} 2基团含量低,它们显示出n型半导体特性。

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