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A High Moment CoFe Soft Magnetic Thin Film Prepared by Electrodeposition

机译:电沉积制备高矩CoFe软磁薄膜

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A CoFe binary alloy film with 24 kG of saturation magnetic flux density, B_s, was prepared by electrodeposition. The B_s, value of the CoFe alloy film prepared by electrodeposition from the conventional bath is usually equal to 21 kG. With the addition of trimethylamineborane, a well-known reducing agent, the B_s, value was found to increase to 23 kG. Furthermore, with the use of a separated compartment dual cell system, a B_s, value as high as 24 kG was reached. For obtaining the highest B_s, it was found to be essential to avoid the oxidation of ferrous ion to ferric ion in the plating bath. The coercivity, H_c, values were 15, 14, and 15 Oe for the films with 20, 23, and 24 kG of B_s, respectively. The key for obtaining high B_s, materials is to avoid the oxidation of ferrous ions in the bath. In addition, it was found that the H_c value of 15 Oe for CoFe film with the highest B_s, value of 24 kG could be lowered to 8 Oe by annealing in an applied magnetic field of 500 Oe.
机译:通过电沉积制备具有24kG的饱和磁通密度B_s的CoFe二元合金膜。由常规浴液通过电沉积制备的CoFe合金膜的B_s值通常等于21kG。发现通过添加三甲基胺硼烷(一种众所周知的还原剂),B_s值增加到23 kG。此外,通过使用分隔的隔室双电池系统,B_s值高达24 kG。为了获得最高的B_s,发现必须避免电镀浴中亚铁离子氧化为三价铁离子。对于具有20、23和24 kG B_s的薄膜,矫顽力H_c的值分别为15、14和15 Oe。获得高B_s材料的关键是避免镀液中亚铁离子的氧化。另外,发现具有最高B_s的CoFe膜的H_c值为15Oe,24kG的值可以通过在500Oe的施加磁场中退火而降低到8Oe。

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