Semicon West showcases a wide array of new offerings, including chamber cleaning gases,low-K materials,and CMP slurries

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Semicon West showcases a wide array of new offerings, including chamber cleaning gases,low-K materials,and CMP slurries

机译：Semicon West展示了一系列新产品，包括腔室清洁气体，低K材料和CMP浆料

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《Electronic Chemicals News》 |2000年第13期|共1页
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正文语种 eng
中图分类物理化学（理论化学）、化学物理学;半导体化学;材料;
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入库时间 2022-08-18 10:47:59

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1. Semicon West showcases a wide array of new offerings, including chamber cleaning gases,low-K materials,and CMP slurries [J] . Chemical Week Newsletter Group Electronic Chemicals News . 2000,第13期

机译：Semicon West展示了一系列新产品，包括腔室清洁气体，低K材料和CMP浆料
2. Fluorianted gases for semiconductor manufacture: process advances in chemical vapor deposition chamber cleaning [J] . Charles C. Allgood Journal of Fluorine Chemistry . 2003,第1期

机译：半导体制造用氟化气体：化学气相沉积室清洁工艺的进步
3. DSM showcases success in scaling 3D printing with wide array of partnerships,new materials and applications [J] . Popular Plastics amp, Packaging Group Popular Plastics & Packaging . 2019,第12期

机译：DSM展示了缩放3D打印的成功，具有广泛的伙伴关系，新材料和应用
4. Investigation of chemical diffusion in Porous Ultra Low-k material during CMP and post-CMP cleaning steps [C] . Arnaud Castex, Samuel Gall, Maria-Luisa Calvo-Munoz, International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference(CMP-MIC) . 2007

机译：在CMP和CMP后清洁步骤中研究多孔Ultra Low-k材料中的化学扩散

Semicon West showcases a wide array of new offerings, including chamber cleaning gases,low-K materials,and CMP slurries

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