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首页> 外文期刊>ECS Journal of Solid State Science and Technology >Sulfate Adsorption onto and Desorption from Silicon Dioxide Films
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Sulfate Adsorption onto and Desorption from Silicon Dioxide Films

机译:硫酸盐在二氧化硅薄膜上的吸附和解吸

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摘要

Sulfate ion adsorption onto and desorption from silicon dioxide surface has been investigated using a quartz crystal microbalance with dissipation monitoring capability (QCM-D). A viscoelastic model was used to calculate adsorption/desorption amount. Experimental results indicate that the adsorption from Na2SO4 and K2SO4 solutions at a pH of 6.8 results in the formation of a multilayer sulfate film with co-adsorption of Na+ or K+ ions. Sulfate ion uptake varied linearly with sulfate concentration in the range 0.01 M to 0.6 M. The first order rate constant for sulfate desorption with DI water is approximately 0.04 s(-1) and 0.12 s(-1) for flow rates of 0.2 ml/min and 1.0 ml/min, respectively. (C) 2016 The Electrochemical Society. All rights reserved.
机译:已使用具有耗散监测功能(QCM-D)的石英晶体微量天平研究了硫酸根离子在二氧化硅表面的吸附和解吸。使用粘弹性模型计算吸附/解吸量。实验结果表明,在pH值为6.8的情况下,Na2SO4和K2SO4溶液的吸附导致形成了具有Na +或K +离子共吸附的多层硫酸盐膜。硫酸根离子吸收量随硫酸根浓度在0.01 M至0.6 M范围内线性变化。去离子水脱附硫酸根的一级速率常数约为0.04 s(-1)和0.12 s(-1),流速为0.2 ml /分钟和1.0毫升/分钟。 (C)2016年电化学学会。版权所有。

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