An investigation of the surface morphology of nanostructured nickel thin films prepared by electrodeposition

摘要

Nickel nanostructure thin films were electrodeposited on copper plates to investigate the fractal study. Scharifker's equations were derived for instantaneous and progressive nucleation and 3D growth of hemispherical centres under diffusion-controlled condition to calculate in situ change of fractal dimension of surface. It was assumed that the layer could be formed completely when fractal dimension of surface inclined to 2. Moreover, the fractal analysis of atomic force microscopy (AFM) images has confirmed the presumed model. Also, the power values of power spectral density (PSD) of the AFM images were determined using fast Fourier transform (FFT) algorithms. The PSD plots are approximated by the k-correlation model. Calculating parameter C using this model revealed that nickel film growth is the intermediation of the bulk and condensation diffusion. The fractal dimension of the nickel thin films was about 2.3 that are estimated as Brownian fractal.