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Annealing effects on transparent conducting properties of amorphous ZnO-In2O3 films

机译:退火对非晶ZnO-In2O3薄膜透明导电性能的影响

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摘要

Structural and transparent conducting properties of amorphous Zn-In-O films deposited by simultaneous sputtering of ZnO and In2O3 targets facing each other were reviewed. Post-annealing under the reductive gas flow was effective on improving unevenness of the amorphous films. [References: 10]
机译:回顾了通过同时溅射彼此面对的ZnO和In2O3靶而沉积的非晶Zn-In-O膜的结构和透明导电特性。在还原气流下的后退火对于改善非晶膜的不均匀性是有效的。 [参考:10]

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