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Analysis of a short interfacial crack from the corner of a rectangular inclusion

机译:从矩形夹杂物的角分析短界面裂纹

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摘要

A useful method is proposed to analyze a short interfacial crack emanating from the corner of a rectangular inclusion. We lint analyze she singular stress field (and the corresponding singularity intensity factor H) without the crack in an infinite medium having the rectangular inclusion. The singular stress field (and the corresponding stress intensity factor K) at the tip of the short interfacial crack lying in the interface of the rectangular inclusion is also analyzed, giving the relation between H and K. With this relation, the stress intensity factor K is easily obtained for the case of a short interfacial crack from the corner of a different rectangular inclusion with different external boundary. This method is based on the assumption that the singular K-field is embedded in another singular H-field, which is much smaller than the specimen geometry. To meet the assumption, it is found here that the eigenfunction corresponding to the next smallest eigenvalue of the singular H-field has to be considered. An example is presented to show the usefulness of the present method, where a short interfacial crack from the corner of a rectangular lead frame in epoxy compound used in electronic packaging is analyzed. It is found that the result of the present method is in good agreement with that of the well-known method.
机译:提出了一种有用的方法来分析从矩形夹杂物的角产生的短界面裂纹。我们分析了她在具有矩形夹杂物的无限大介质中没有裂纹的情况下的奇异应力场(以及相应的奇异强度因子H)。还分析了位于矩形夹杂物界面上的短界面裂纹尖端处的奇异应力场(以及相应的应力强度因子K),给出了H和K之间的关系。通过这种关系,应力强度因子K对于来自具有不同外部边界的不同矩形夹杂物的拐角处的短界面裂纹,很容易获得。此方法基于以下假设:奇异K场嵌入另一个比试样几何体小得多的奇异H场。为了满足该假设,在这里发现必须考虑与奇异H场的下一个最小特征值相对应的特征函数。给出了一个实例来说明本方法的有效性,其中分析了在电子封装中使用的环氧化合物中矩形引线框角处的短界面裂纹。发现本方法的结果与公知方法的结果非常一致。

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