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首页> 外文期刊>Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films >Rapid heat treatment for spin coated ITO films by electron plasma annealing method
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Rapid heat treatment for spin coated ITO films by electron plasma annealing method

机译:电子等离子体退火法对旋涂ITO薄膜进行快速热处理

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摘要

A method of Electron Plasma Annealing (EPA) is developed. The EPA method allows a lower substrate temperature to be used in spin-coating-type ITO film fabrication. Using the EPA method is expected to have beneficial sample surface heating and plasma treatment effects. The ITO films which are treated in an N-2 gas atmosphere by EPA exhibit lower resistivity and higher transmittance than ITO films fabricated with a thermal treatment at 550 degreesC. The ITO films obtained by N-2 EPA treatment also show higher density and purity, although they have finer grain compared to the thermal annealing films. These structural features should be the reason for the good electrical and optical characteristics of ITO films. (C) 2002 Elsevier Science B.V All rights reserved. References: 8
机译:开发了一种电子等离子体退火(EPA)方法。EPA方法允许在旋涂型ITO薄膜制造中使用较低的基材温度。使用EPA方法有望产生有益的样品表面加热和等离子体处理效果。EPA在N-2气体气氛中处理的ITO薄膜比在550°C下热处理的ITO薄膜具有更低的电阻率和更高的透射率。通过N-2 EPA处理得到的ITO薄膜也显示出更高的密度和纯度,尽管与热退火膜相比,它们具有更细的晶粒。这些结构特点应该是ITO薄膜具有良好电学和光学特性的原因。(C) 2002 Elsevier Science B.V 保留所有权利。[参考文献: 8]

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