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Biaxial testing of nanoscale films on compliant substrates: Fatigue and fracture

机译:在柔顺基板上对纳米级薄膜进行双轴测试:疲劳和断裂

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摘要

Two problems of technological importance for microelectromechanical systems (MEMS) and microelectronics industry are addressed: fatigue of thin films and nanoscale film cracking. A device is described that can (1) conduct biaxial fatigue tests on thin films and (2) be utilized to study fracture patterns in nanoscale coatings under biaxial stress state. Thin-film specimens, in the form of circular membranes, are exposed to cyclic pressures between two fixed pressure limits. Corresponding pressure and specimen deflection are measured. Experimental results, including hysteresis loops spanning deflections of 15-50 μm are presented for 4.6-μm-thick polyimide films. Furthermore, the evolution of crack patterns in a 150-nm-thick Al film deposited on a polyimide substrate is studied. Critical mode I stress intensity factor for Al is extracted from experimental results.
机译:解决了对微机电系统(MEMS)和微电子行业具有重要技术意义的两个问题:薄膜疲劳和纳米级薄膜开裂。描述了一种装置,可以(1)对薄膜进行双轴疲劳试验,(2)用于研究双轴应力状态下纳米级涂层的断裂模式。薄膜试样以圆形膜的形式暴露在两个固定压力限值之间的循环压力下。测量相应的压力和试样挠度。给出了4.6 μm厚聚酰亚胺薄膜的实验结果,包括跨越15-50 μm偏转的滞回环。此外,还研究了沉积在聚酰亚胺衬底上的150 nm厚Al薄膜中裂纹图案的演变。从实验结果中提取了Al的临界模式I应力强度因子。

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