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Effect of implantation dose on the hardness, friction, and wear of Sbhyphen;implanted Al

机译:Effect of implantation dose on the hardness, friction, and wear of Sbhyphen;implanted Al

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摘要

The hardness, friction, and wear behavior of Sb+hyphen;implanted commercially pure Al was investigated. The specimens were implanted at 200 KeV to doses of between 1013and 1017ions/cm2. Hardness was observed to increase linearly with dose. The increase in wear resistance was not dose dependent and the high doses were found to increase friction. Rutherford backscattering analysis revealed a significant damage of the Al lattice at high doses. It also showed that Fe and Cu, which are impurities in Al, diffused to and away from the implanted surface, respectively. Scanning electron microscopy indicated the formation of Sb and Fe precipitates. The mobility of implanted ions and impurity atoms is considered to be associated with the point defects created during the implantation of Sb+. The changes in the mechanical properties investigated probably resulted from the pinning effect that these defects and precipitates, and their associated stress fields, exert on dislocations.

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  • 来源
    《journal of applied physics 》 |1984年第9期| 3308-3314| 共页
  • 作者

    Peter B. Madakson;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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