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首页> 外文期刊>International Journal of Polymeric Materials >The General Patterns of Photooxidative Degradation of Aliphatic Polyamides
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The General Patterns of Photooxidative Degradation of Aliphatic Polyamides

机译:The General Patterns of Photooxidative Degradation of Aliphatic Polyamides

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摘要

A new mechanism for the photooxidation of aliphatic polyamides, which was suggested by one of the authors, is essentially verified by comparing the experimental data described earlier with the exact solution of a corresponding system of differential kinetic equations. For the most interesting particular case of polyamide photooxidation under the action of long wavelength light the solution using a quasistationary approximation is justified. In this case the kinetics of changes in the concentrations of the most important intermediate products is represented by a hyperbolic functions.

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