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EUV filter responses to plasma emission for the nonthermalK-distributions

机译:EUV filter responses to plasma emission for the nonthermalK-distributions

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摘要

The responses to plasma emission of the TRACE EUV filters are computed by integrating their spectral responses over the syntheticspectra obtained from the CHIANTI database. The filter responses to emission are functions of temperature, electron density, and theassumed electron distribution function. It is shown here that, for the nonthermal K-distributions, the resulting responses to emissionare more broadly dependent on T, and their maxima are flatter than for the Maxwellian electron distribution. The positions of themaxima can also be shifted. Filter reponses to T are density-dependent as well. The influence of the nonthermal K-distributions on thediagnostics of T from the observations in all three EUV filters is discussed.

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