Controllable Fabrication and Characterization of Si-coated Multiwalled Carbon Nanotubes

摘要

Quasi atomic layer deposition method has been utilized to coat MWNTs with continuous Si film. This deposition technique involves the decomposition of gaseous monosilane that is pumped into the vacuumed reaction chamber and the subsequent evacuation of the resultants alternately. The thickness of the film increases by repetitively employing this deposition process. X-ray diffraction, Raman spectra and transmission electron microscopy results indicate that the structure and the morphology of the film could be easily controlled by deposition temperature.