Preparation of PLZT Ferroelectric Films by RF Sputtering on 200mm phi Substrate

摘要

(Pb, La)(Zr, Ti)O_3 (PLZT) thin films were deposited on 200mm phi Pt/Ti/SiO_2/Si substrates by RF magnetron Sputtering using multichamber production system. The Pb content in PLZT films deposited at low temperature was measured by X-ray fluorescence spectroscopy (XRF), and ferroelectrics properties were measured. Good uniformities of Pb content and deposition rate were achieved on 200mm phi) substrate. For ferroelectrics properties, only small deference was observed between the center and the edge of 200mm phi) substrate.