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Structure, Morphology, and Properties of Strontium Barium Niobate Thin Films Grown by Pulsed Laser Deposition

机译:脉冲激光沉积生长铌酸锶钡钡薄膜的结构,形态和性能

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Strontium barium niobate (Sr_xBa_(1-x)Nb_2O_6) thin films with x = 0.61 were grown by reactive Pulsed Laser Deposition and characterized as to their structure, composition, and optical properties. Films were deposited on MgO (001) and fused silica substrates at a wide range of growth rates. A detailed study of film microstructure and surface morphology was performed with x-ray diffraction and atomic force microscopy techniques. Refractive indices of the samples were determined with transmission spectroscopy. Films with excellent texture, and oriented with the c-axis normal to the substrate surface were obtained on the MgO substrates, particularly at lower growth rates. Films grown on fused silica at 700 deg C are at least partially polycrystalline, showing preferred orientation with the c-axis normal to the substrate surface, while those grown at lower temperatures are amorphous. Crystal grain sizes of the films are strongly dependent on both sample growth temperature and laser pulse repetition rate.
机译:x = 0.61的铌酸锶钡(Sr_xBa_(1-x)Nb_2O_6)薄膜通过反应脉冲激光沉积法生长,并对其结构,组成和光学性质进行了表征。薄膜以很宽的增长率沉积在MgO(001)和熔融石英衬底上。使用X射线衍射和原子力显微镜技术对薄膜的微观结构和表面形态进行了详细研究。用透射光谱法测定样品的折射率。在MgO基板上,尤其是在较低的生长速率下,获得了质地极佳且c轴垂直于基板表面的薄膜。在700摄氏度的熔融石英上生长的薄膜至少部分是多晶的,显示出优选的取向,其c轴垂直于基材表面,而在较低温度下生长的薄膜是非晶态的。薄膜的晶粒尺寸在很大程度上取决于样品生长温度和激光脉冲重复率。

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