Effects of CF4/O2gas plasma power/exposure time on dielectric properties and breakdown voltages of PVDF films

摘要

AbstractDielectric properties and electrical breakdown strengths were measured on 12‐μm‐thick poly(vinylidene fluoride) films before and after exposure to various power levels and exposure times in a 96 CF4/4 O2gas plasma. Significant changes in dielectric constant, dielectric losses, and breakdown voltages were observed. Breakdown voltages for PVDF films as a function of exposure time and plasma power appear to go through a maximum. © 1992 John WileySons