Fe/Fehyphen;N multilayer films with low coercivity zero magnetostriction and high saturation magnetization

摘要

A method of fabricating of Fe/Fehyphen;N multilayer films in the form of alternating thin films of Fe separated by very thin interlayers of Fehyphen;N sputtered in the presence of nitrogen is described. It was found that the properties of these films depended on the thickness of Fe and Fehyphen;N layers and the bias voltage. There is a region where the composite films have coercivity less than 1 Oe, with zero or nearhyphen;zero magnetostriction. The normally high saturation magnetization of Fe with value of 20 kG was preserved.